A rapid thermal processing system for microelectronics -
Chapter 18, Problem 18.22(choose chapter or problem)
A rapid thermal processing system for microelectronics - manufacturing uses three concentric lamp heater ar- ~ rays to keep the wafer temperature uniform. The gain matrix for the system is [ 3.38 2.50 0.953] K = 3.20 2.38 0.986 3.13 2.33 1.054 The system experiences difficulties in controlling all three temperatures uniformly. Examine possible control difficulties using RGA and SV A analyses.
Unfortunately, we don't have that question answered yet. But you can get it answered in just 5 hours by Logging in or Becoming a subscriber.
Becoming a subscriber
Or look for another answer