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Optimizing semiconductor material processing. Fluorocarbon
Chapter 12, Problem 156SE(choose chapter or problem)
Problem 156SE
Optimizing semiconductor material processing. Fluorocarbon plasmas are used in the production ofsemiconductor materials. In the Journal of AppliedPhysics (Dec. 1, 2000), electrical engineers at NagoyaUniversity (Japan) studied the kinetics of fluorocarbonplasmas in order to optimize material processing. In oneportion of the study, the surface production rate of fluorocarbon radicals emitted from the production processwas measured at various points in time (in milliseconds)after the radio frequency power was turned off. The dataare given in the next table. Consider a model relating surface production rate (y) to time (x).
Rate |
Time |
Rate |
Time |
1.00 |
0.1 |
0.00 |
1.7 |
0.80 |
0.3 |
-0.10 |
1.9 |
0.40 |
0.5 |
-0.15 |
2.1 |
0.20 |
0.7 |
-0.05 |
2.3 |
0.05 |
0.9 |
-0.13 |
2.5 |
0.00 |
1.1 |
-0.08 |
2.7 |
-0.05 |
1.3 |
0.00 |
2.9 |
-0.02 |
1.5 |
a. Graph the data in a scatterplot. What trend do youobserve?
b. Fit a quadratic model to the data. Give the leastsquares prediction equation.
c. Is there sufficient evidence of upward curvature inthe relationship between surface production rate andtime after turnoff? Use α = .05.
Questions & Answers
QUESTION:
Problem 156SE
Optimizing semiconductor material processing. Fluorocarbon plasmas are used in the production ofsemiconductor materials. In the Journal of AppliedPhysics (Dec. 1, 2000), electrical engineers at NagoyaUniversity (Japan) studied the kinetics of fluorocarbonplasmas in order to optimize material processing. In oneportion of the study, the surface production rate of fluorocarbon radicals emitted from the production processwas measured at various points in time (in milliseconds)after the radio frequency power was turned off. The dataare given in the next table. Consider a model relating surface production rate (y) to time (x).
Rate |
Time |
Rate |
Time |
1.00 |
0.1 |
0.00 |
1.7 |
0.80 |
0.3 |
-0.10 |
1.9 |
0.40 |
0.5 |
-0.15 |
2.1 |
0.20 |
0.7 |
-0.05 |
2.3 |
0.05 |
0.9 |
-0.13 |
2.5 |
0.00 |
1.1 |
-0.08 |
2.7 |
-0.05 |
1.3 |
0.00 |
2.9 |
-0.02 |
1.5 |
a. Graph the data in a scatterplot. What trend do youobserve?
b. Fit a quadratic model to the data. Give the leastsquares prediction equation.
c. Is there sufficient evidence of upward curvature inthe relationship between surface production rate andtime after turnoff? Use α = .05.
ANSWER:Step 1 of 6
It is given that the study on the kinetics of fluorocarbon plasmas in order to optimize material processing.
The data on the surface production rate of fluorocarbon radicals emitted from the production process was measured at various points in time after the radio frequency power was turned off.
Let 
SPRate |
Time |
1 |
0.1 |
0.8 |
0.3 |
0.4 |
0.5 |
0.2 |
0.7 |
0.05 |
0.9 |
0 |
1.1 |
-0.05 |
1.3 |
-0.02 |
1.5 |
0 |
1.7 |
-0.1 |
1.9 |
-0.15 |
2.1 |
-0.05 |
2.3 |
-0.13 |
2.5 |
-0.08 |
2.7 |
0 |
2.9 |
(a) Using Minitab instructions we construct the scattergram for surface production rate versus and time (in milliseconds).
