A matched CMOS inverter fabricated in a process for which | StudySoup

Textbook Solutions for Microelectronic Circuits

Chapter 13 Problem 13.39

Question

A matched CMOS inverter fabricated in a process for which Cox = 3.7 fF/m2, nCox = 180 A/V2, pCox = 45 A/V2, = = 0.7 V, and VDD = 3.3 V, uses Wn = 0.75 m and Ln = Lp = 0.5 m. The overlap capacitance and the effective drainbody capacitance per micrometer of gate width are 0.4 fF and 1.0 fF, respectively. The wiring capacitance is Cw =2 fF. If the inverter is driving another identical inverter, find tPLH, tPHL, and tP. For how much additional capacitance load does the propagation delay increase by 50%?

Solution

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The first step in solving 13 problem number 39 trying to solve the problem we have to refer to the textbook question: A matched CMOS inverter fabricated in a process for which Cox = 3.7 fF/m2, nCox = 180 A/V2, pCox = 45 A/V2, = = 0.7 V, and VDD = 3.3 V, uses Wn = 0.75 m and Ln = Lp = 0.5 m. The overlap capacitance and the effective drainbody capacitance per micrometer of gate width are 0.4 fF and 1.0 fF, respectively. The wiring capacitance is Cw =2 fF. If the inverter is driving another identical inverter, find tPLH, tPHL, and tP. For how much additional capacitance load does the propagation delay increase by 50%?
From the textbook chapter CMOS Digital Logic Circuits you will find a few key concepts needed to solve this.

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Title Microelectronic Circuits 6 
Author Adel S. Sedra
ISBN 9780195323030

A matched CMOS inverter fabricated in a process for which

Chapter 13 textbook questions

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